About the
Subject:
Lithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures, meaning patterns with at least one lateral dimension between 1 and 100 nm. Different approaches can be categorized in serial or parallel, mask or maskless/direct-write, top-down or bottom-up, beam or tip-based, resist-based or resist-less methods.
Microsystems – Materials requirements-Necessity for a clean room– Microfabrication process flow diagram– Process integration - Etching techniques-Lithography -Optical lithography-Multistage scanners – Resolution enhancement techniques - axis illumination- Optical proximity correction-Maskless optical projection lithography – Zone plate array lithography - Extreme ultraviolet lithography – Light sources -Scanning electron-beam lithography- Scattering with angular limitation projection e-beam lithography (SCALPEL) - Ion beam lithograph- atom lithography-Nanoimprint lithography - Soft Lithography- Moulding/Replica moulding-Dip-Pen Lithography– Self-assembly
Time to be
planned :
1 or 2 days
1 or 2 days
Kind of
program :
3D based Seminar and Guest Lecture for
the Students
Reason for
the program :
Kalam Scientist Team aiming to build young generation Scientist
Kalam Scientist Team aiming to build young generation Scientist
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